Invention Grant
- Patent Title: Polishing composition
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Application No.: US15129835Application Date: 2015-03-30
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Publication No.: US10344184B2Publication Date: 2019-07-09
- Inventor: Masashi Teramoto , Tatsuya Nakauchi , Noriaki Sugita , Shinichi Haba , Akiko Miyamoto
- Applicant: NITTA HAAS INCORPORATED
- Applicant Address: JP Osaka
- Assignee: NITTA HAAS INCORPORATED
- Current Assignee: NITTA HAAS INCORPORATED
- Current Assignee Address: JP Osaka
- Agency: Clark & Brody
- Priority: JP2014-073433 20140331
- International Application: PCT/JP2015/059921 WO 20150330
- International Announcement: WO2015/152149 WO 20151008
- Main IPC: C09G1/02
- IPC: C09G1/02 ; H01L21/02 ; C09K3/14

Abstract:
Proposed is a polishing composition including hydroxyethyl cellulose, water and abrasive grains, wherein the hydroxyethyl cellulose has a molecular weight of 500,000 or more and 1,500,000 or less, and the proportion of the hydroxyethyl cellulose adsorbed to the abrasive grains is 30% or more and 90% or less.
Public/Granted literature
- US20170174939A1 POLISHING COMPOSITION Public/Granted day:2017-06-22
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