Invention Grant
- Patent Title: Method of determining a concentration of a material not dissolved by silicon etchants contaminating a product
-
Application No.: US15082164Application Date: 2016-03-28
-
Publication No.: US10345211B2Publication Date: 2019-07-09
- Inventor: John W. Hadd , Robert Scott Leser , Jonathon Host
- Applicant: Hemlock Semiconductor Corporation
- Applicant Address: US MI Hemlock
- Assignee: HEMLOCK SEMICONDUCTOR OPERATIONS LLC
- Current Assignee: HEMLOCK SEMICONDUCTOR OPERATIONS LLC
- Current Assignee Address: US MI Hemlock
- Agency: Cantor Colburn LLP
- Main IPC: G01N5/04
- IPC: G01N5/04 ; C01B33/037

Abstract:
A method of determining a concentration of plastic or other material not dissolved by silicon etchants contaminating a silicon product comprising: obtaining a sample of the silicon product contaminated with the plastic or other material not dissolved by silicon etchants; placing the sample of the silicon product into a ultrasonic bath liquid to produce a slurry comprising the ultrasonic bath liquid, silicon dust, and the plastic or other material not dissolved by silicon etchants; filtering the slurry with a first filter to produce a cake comprising the silicon dust and the plastic or other material not dissolved by silicon etchants separated from the sample of the silicon product; and analyzing the cake to determine the concentration of plastic or other material not dissolved by silicon etchants contaminating the silicon product.
Public/Granted literature
Information query