Invention Grant
- Patent Title: Method and apparatus for analyzing a target material
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Application No.: US15063095Application Date: 2016-03-07
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Publication No.: US10345289B2Publication Date: 2019-07-09
- Inventor: Jean-Pierre Leburton
- Applicant: THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS
- Applicant Address: US IL Urbana
- Assignee: The Board of Trustees of the University of Illinois
- Current Assignee: The Board of Trustees of the University of Illinois
- Current Assignee Address: US IL Urbana
- Agency: Guntin & Gust, PLC
- Agent Mark Wilinski
- Main IPC: G01N27/447
- IPC: G01N27/447 ; G01N33/487 ; G01N30/88

Abstract:
Aspects of the subject disclosure may include, for example, an apparatus having a material having a through-hole, a gate coupled to the material for controlling a charge concentration of the material, a sensor, and a controller coupled to the material, the gate and the sensor. The controller can perform operations including applying a first voltage potential to the material to induce a flow of current in the material, applying a second voltage potential to the gate to adjust the charge concentration of the material, and receiving sensing data from the sensor responsive to a change in electrical properties of the material caused by a target traversing the first through-hole of the material. The through-hole causes a plurality of structural portions of the target to be misaligned with a direction of the flow current in the material. Additional embodiments are disclosed.
Public/Granted literature
- US20160187290A1 METHOD AND APPARATUS FOR ANALYZING A TARGET MATERIAL Public/Granted day:2016-06-30
Information query