Invention Grant
- Patent Title: Method for producing a lens for a lithography apparatus, and measurement system
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Application No.: US15813660Application Date: 2017-11-15
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Publication No.: US10345547B2Publication Date: 2019-07-09
- Inventor: Steffen Fritzsche , Juergen Baier , Rolf Freimann
- Applicant: Carl Zeiss SMT GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102015209173 20150520
- Main IPC: G02B7/00
- IPC: G02B7/00 ; G01M11/02 ; G03F7/20 ; G02B7/02
Abstract:
A method for producing a lens for a lithography apparatus is disclosed. A measurement system for ascertaining an optical characteristic of a partial lens for a lithography apparatus is also disclosed.
Public/Granted literature
- US20180074278A1 METHOD FOR PRODUCING A LENS FOR A LITHOGRAPHY APPARATUS, AND MEASUREMENT SYSTEM Public/Granted day:2018-03-15
Information query
IPC分类:
| G | 物理 |
| G02 | 光学 |
| G02B | 光学元件、系统或仪器 |
| G02B7/00 | 光学元件的安装、调整装置或不漏光连接 |
