Invention Grant
- Patent Title: Mueller-matrix microscope and measurement and calibration methods using the same
-
Application No.: US15487407Application Date: 2017-04-13
-
Publication No.: US10345568B2Publication Date: 2019-07-09
- Inventor: Xiuguo Chen , Jun Chen , Chao Chen , Shiyuan Liu
- Applicant: Wuhan Eoptics Technology Co., Ltd.
- Applicant Address: CN Wuhan
- Assignee: WUHAN EOPTICS TECHNOLOGY CO., LTD.
- Current Assignee: WUHAN EOPTICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Wuhan
- Agency: Matthias Scholl P.C.
- Agent Matthias Scholl
- Priority: CN201611140741 20161212
- Main IPC: G02B21/36
- IPC: G02B21/36 ; G02B21/00 ; G02F1/00 ; G02B6/42 ; G01N21/21 ; G02B5/30 ; G02B26/08

Abstract:
A Mueller-matrix microscope, including: a polarizing unit and an analyzing unit. The polarizing unit is configured to modulate a light beam emitted from an external light source module to yield a polarized light beam, and then to project the polarized light beam on the surface of a sample to be measured. The analyzing unit is configured to analyze the polarization state of a light beam reflected from the surface of the sample, to acquire information of the sample. The analyzing unit includes a polarization state analyzer (PSA) and a backside reflection suppression (BRS) unit. The PSA unit is configured to demodulate the polarization state of the light beam; and the BRS unit is configured to suppress the backside reflections from transparent substrate.
Public/Granted literature
- US20180164566A1 MUELLER-MATRIX MICROSCOPE Public/Granted day:2018-06-14
Information query