- Patent Title: Manufacturing method of a mask plate and a color filter substrate
-
Application No.: US15109029Application Date: 2016-05-24
-
Publication No.: US10345693B2Publication Date: 2019-07-09
- Inventor: Hui He
- Applicant: Shenzhen China Star Optoelectronics Technology Co., Ltd.
- Applicant Address: CN Shenzhen
- Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd.
- Current Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd.
- Current Assignee Address: CN Shenzhen
- Agent Andrew C. Cheng
- Priority: CN201610265438 20160426
- International Application: PCT/CN2016/083093 WO 20160524
- International Announcement: WO2017/185438 WO 20171102
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F1/32 ; G02B5/22 ; G02B5/20 ; G03F7/00 ; G03F7/16 ; G03F7/30

Abstract:
The present disclosure discloses a mask plate, the mask plate includes: a substrate; a plurality of shading portions respectively arranged in intervals on a surface of the substrate; a plurality of semi-transparent portions respectively arranged against both sides of the shading portions, wherein, a transparent region between two adjacent shading portions are formed between two-adjacent-semi-transparent-portions. The present disclosure discloses a manufacturing method of a color filter substrate.
Public/Granted literature
- US20180101092A1 A Manufacturing Method Of A Mask Plate And A Color Filter Substrate Public/Granted day:2018-04-12
Information query
IPC分类: