Invention Grant
- Patent Title: Negative-tone resist compositions and multifunctional polymers therein
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Application No.: US14479378Application Date: 2014-09-08
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Publication No.: US10345700B2Publication Date: 2019-07-09
- Inventor: Luisa D. Bozano , Daisuke Domon , Yoshio Kawai , Keiichi Masunaga , Martha I. Sanchez , Daniel P. Sanders , Ratnam Sooriyakumaran , Linda K. Sundberg , Satoshi Watanabe
- Applicant: International Business Machines Corporation , Shin-Etsu Chemical Co., Ltd.
- Applicant Address: US NY Armonk JP Tokyo
- Assignee: International Business Machines Corporation,Shin-Etsu Chemical Co., Ltd.
- Current Assignee: International Business Machines Corporation,Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: US NY Armonk JP Tokyo
- Agency: VLP Law Group, LLP
- Agent Dianne E. Reed
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F7/038 ; G03F7/32 ; C08F220/18 ; C08F220/30 ; C08F220/24 ; G03F7/004
Abstract:
A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers.
Public/Granted literature
- US20160070169A1 NEGATIVE-TONE RESIST COMPOSITIONS AND MULTIFUNCTIONAL POLYMERS THEREIN Public/Granted day:2016-03-10
Information query
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