Invention Grant
- Patent Title: Photoresist polymers, photoresist compositions, methods of forming patterns and methods of manufacturing semiconductor devices
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Application No.: US15808116Application Date: 2017-11-09
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Publication No.: US10345701B2Publication Date: 2019-07-09
- Inventor: Jin Park , Hyun-woo Kim , Jin-Kyu Han , Cha-Won Koh
- Applicant: Jin Park , Hyun-woo Kim , Jin-Kyu Han , Cha-Won Koh
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2014-0178949 20141212
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/075 ; H01L21/311 ; H01L27/11582 ; G03F7/039 ; H01L27/1157 ; H01L27/11575 ; H01L21/3213 ; H01L21/768
Abstract:
A photoresist polymer includes a first repeating unit and a second repeating unit. The first repeating unit includes a fluorine leaving group that is configured to be removed by a photo-chemical reaction. The second repeating unit includes a silicon-containing leaving group that is configured to be removed by the fluorine leaving group when the fluorine leaving group is removed from the first repeating unit.
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Information query
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