Invention Grant
- Patent Title: Cylindrical vertical SI etched channel 3D switching devices
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Application No.: US15857430Application Date: 2017-12-28
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Publication No.: US10347311B1Publication Date: 2019-07-09
- Inventor: Gian Sharma , Amitay Levi , Andrew J. Walker , Kuk-Hwan Kim , Dafna Beery
- Applicant: Spin Memory, Inc.
- Applicant Address: US CA Fremont
- Assignee: SPIN MEMORY, INC.
- Current Assignee: SPIN MEMORY, INC.
- Current Assignee Address: US CA Fremont
- Agency: Zilka-Kotab, P.C.
- Main IPC: H01L29/66
- IPC: H01L29/66 ; G11C11/16 ; H01L29/78 ; H01L27/22

Abstract:
A switching device, according to one embodiment, includes: a cylindrical pillar; an annular cylindrical oxide layer which encircles a portion of the cylindrical pillar; an annular cylindrical gate contact which encircles a portion of the annular cylindrical oxide layer; and a source contact which encircles a portion of the cylindrical pillar toward a first end of the cylindrical pillar. Other systems are also described in additional embodiments herein which provide various different switching devices having improved components including improved cylindrical gate contacts, improved source contacts, and/or improved drain contacts. These improved systems and components thereof may be implemented in vertical transistor structures which also include the aforementioned cylindrical pillar and cylindrical gate contact in comparison to conventional surface transistor structures.
Public/Granted literature
- US20190206461A1 CYLINDRICAL VERTICAL SI ETCHED CHANNEL 3D SWITCHING DEVICES Public/Granted day:2019-07-04
Information query
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