Invention Grant
- Patent Title: Stacked oxide material, semiconductor device, and method for manufacturing the semiconductor device
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Application No.: US16031336Application Date: 2018-07-10
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Publication No.: US10347771B2Publication Date: 2019-07-09
- Inventor: Shunpei Yamazaki
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office
- Agent Eric J. Robinson
- Priority: JP2009-270856 20091128
- Main IPC: H01L29/04
- IPC: H01L29/04 ; H01L21/00 ; H01L29/786 ; H01L21/02 ; H01L27/12 ; H01L29/24

Abstract:
One embodiment is a method for manufacturing a stacked oxide material, including the steps of forming an oxide component over a base component; forming a first oxide crystal component which grows from a surface toward an inside of the oxide component by heat treatment, and leaving an amorphous component just above a surface of the base component; and stacking a second oxide crystal component over the first oxide crystal component. In particular, the first oxide crystal component and the second oxide crystal component have common c-axes. Same-axis (axial) growth in the case of homo-crystal growth or hetero-crystal growth is caused.
Public/Granted literature
- US20180323305A1 STACKED OXIDE MATERIAL, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING THE SEMICONDUCTOR DEVICE Public/Granted day:2018-11-08
Information query
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