Invention Grant
- Patent Title: Process for cleaning anodic oxide pore structures
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Application No.: US15054004Application Date: 2016-02-25
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Publication No.: US10351966B2Publication Date: 2019-07-16
- Inventor: James A. Curran , William D. Burke
- Applicant: Apple Inc.
- Applicant Address: US CA Cupertino
- Assignee: Apple Inc.
- Current Assignee: Apple Inc.
- Current Assignee Address: US CA Cupertino
- Agency: Dickinson Wright RLLP
- Main IPC: C25D11/20
- IPC: C25D11/20 ; C25D11/24 ; C25F1/00 ; C25D11/02 ; H04M1/02

Abstract:
Processes for cleaning anodic film pore structures are described. The processes employ methods for gas generation within the pores to flush out contamination within the anodic film. The pore cleaning processes can eliminate cosmetic defects related to anodic pore contamination during the manufacturing process. For example, an anodic film that is adjacent to a polymer piece can experience contamination originating from a gap between the anodic film and polymer piece, which can inhibit colorant uptake of the anodic film in areas proximate the polymer piece. In some cases, an alternating current anodizing process or a separate operation of cathodic polarization is implemented to generate hydrogen gas that bubbles out of the pores, forcing the contaminates out of the anodic film.
Public/Granted literature
- US20170088967A1 PROCESS FOR CLEANING ANODIC OXIDE PORE STRUCTURES Public/Granted day:2017-03-30
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