Invention Grant
- Patent Title: Method of lamination of dielectric circuit materials using ultrasonic means
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Application No.: US15331307Application Date: 2016-10-21
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Publication No.: US10356914B2Publication Date: 2019-07-16
- Inventor: Patrick J. Kocurek , Sankerlingam Rajendran
- Applicant: Raytheon Company
- Applicant Address: US MA Waltham
- Assignee: RAYTHEON COMPANY
- Current Assignee: RAYTHEON COMPANY
- Current Assignee Address: US MA Waltham
- Agency: Cantor Colburn LLP
- Main IPC: H05K3/46
- IPC: H05K3/46 ; H05K3/00 ; H05K3/30 ; H05K3/40 ; H05K1/18

Abstract:
A method of lamination of dielectric circuit materials is provided. The method includes preparing first and second circuit layers of dielectric materials, stacking the first and second circuit layers with circuit trace elements interposed between the first and second circuit layers and ultrasonically welding the second circuit layer onto the first circuit layer around the circuit trace elements.
Public/Granted literature
- US20170290172A1 ULTRASONIC LAMINATION OF DIELECTRIC CIRCUIT MATERIALS Public/Granted day:2017-10-05
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