Invention Grant
- Patent Title: Block copolymer nanostructures formed by disturbed self-assembly and uses thereof
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Application No.: US15107647Application Date: 2014-12-18
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Publication No.: US10364141B2Publication Date: 2019-07-30
- Inventor: Yu Wang , Wei-hong Zhong
- Applicant: WASHINGTON STATE UNIVERSITY
- Applicant Address: US WA Pullman
- Assignee: WASHINGTON STATE UNIVERSITY
- Current Assignee: WASHINGTON STATE UNIVERSITY
- Current Assignee Address: US WA Pullman
- Agency: W & C IP
- International Application: PCT/US2014/071140 WO 20141218
- International Announcement: WO2015/100126 WO 20150702
- Main IPC: B81C1/00
- IPC: B81C1/00 ; C08F299/04 ; C08G81/00 ; B82Y40/00

Abstract:
Block copolymer nanostructures such as nanosheets, nanoribbons, and nanotubes, are provided. The nanotructures are formed by the self-assembly of block copolymers during evaporation of solvent from a sol that has been “disturbed”, either i) internally by the introduction of relief (e.g. curvature) and/or the inclusion of nanoparticles in the sol; or ii) externally, e.g. by physical deformation of a semi-solid form of the sol, or a combination of internal and external disturbance. The nanostructures have uses in, for example, energy devices, electronics, sensors and drug delivery applications.
Public/Granted literature
- US20160332869A1 BLOCK COPOLYMER NANOSTRUCTURES FORMED BY DISTURBED SELF-ASSEMBLY AND USES THEREOF Public/Granted day:2016-11-17
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