Invention Grant
- Patent Title: Monomer, organic layer composition, organic layer, and method of forming patterns
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Application No.: US15176191Application Date: 2016-06-08
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Publication No.: US10364221B2Publication Date: 2019-07-30
- Inventor: Hyo Young Kwon , Sunhae Kang , Ran Namgung , Younhee Nam , Yumi Heo , Young Min Kim , Soohyoun Mun
- Applicant: SAMSUNG SDI CO., LTD.
- Applicant Address: KR Yongin-si, Gyeonggi-do
- Assignee: SAMSUNG SDI CO., LTD.
- Current Assignee: SAMSUNG SDI CO., LTD.
- Current Assignee Address: KR Yongin-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2015-0095960 20150706
- Main IPC: G03F7/09
- IPC: G03F7/09 ; C07D209/12 ; C07D209/62 ; C07D209/82 ; C07D209/90 ; C07D311/82 ; C07D307/80 ; C07D307/92 ; C07D333/56 ; C07D333/74 ; C07D335/12 ; C07D345/00 ; C07D219/00 ; C09D179/04 ; C07D209/86 ; G03F7/075
Abstract:
A monomer, an organic layer composition, an organic layer, and a method of forming a pattern, the monomer being represented by the following Chemical Formula 1:
Public/Granted literature
- US20170008843A1 MONOMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FORMING PATTERNS Public/Granted day:2017-01-12
Information query
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