Invention Grant
- Patent Title: Composition and method of producing siliceous film
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Application No.: US15856659Application Date: 2017-12-28
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Publication No.: US10364372B2Publication Date: 2019-07-30
- Inventor: Yasushi Fujii , Kunihiro Noda , Hiroki Chisaka , Kazuya Someya , Koichi Misumi , Dai Shiota
- Applicant: TOKYO OHKA KOGYO CO., LTD.
- Applicant Address: JP Kawasaki-shi
- Assignee: TOKYO OHKA KOGYO CO., LTD.
- Current Assignee: TOKYO OHKA KOGYO CO., LTD.
- Current Assignee Address: JP Kawasaki-shi
- Agency: Knobbe, Martens, Olson & Bear LLP
- Priority: JP2017-004430 20170113
- Main IPC: C08G77/62
- IPC: C08G77/62 ; C09D183/16 ; H01L21/02 ; C08L83/16
Abstract:
A composition capable of stably providing a high-quality siliceous film even under relatively low-temperature heating conditions, and a method of using the composition for forming a siliceous film. The composition includes a polysilazane and an imidazole group-containing compound represented by Formula (B).
Public/Granted literature
- US20180201807A1 COMPOSITION AND METHOD OF PRODUCING SILICEOUS FILM Public/Granted day:2018-07-19
Information query
