Invention Grant
- Patent Title: Substrate for crystal growth having a plurality of group III nitride seed crystals arranged in a disc shape
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Application No.: US15361226Application Date: 2016-11-25
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Publication No.: US10364510B2Publication Date: 2019-07-30
- Inventor: Tekehiro Yoshida
- Applicant: SCIOCS COMPANY LIMITED , SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Hitachi-Shi, Ibaraki JP Tokyo
- Assignee: SCIOCS COMPANY LIMITED,SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SCIOCS COMPANY LIMITED,SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Hitachi-Shi, Ibaraki JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2015-229973 20151125; JP2016-229163 20161125
- Main IPC: C30B29/40
- IPC: C30B29/40 ; C30B25/20

Abstract:
There is provided a substrate for crystal growth used for a vapor phase growth of a crystal, wherein a plurality of seed crystal substrates made of a group III nitride crystal are arranged in a disc shape, so that their main surfaces are parallel to each other and adjacent lateral surfaces are in contact with each other; and the plurality of seed crystal substrates constituting at least a portion other than a peripheral portion of the substrate for crystal growth respectively has a main surface whose planar shape is a regular hexagon, and a honeycomb pattern obtained by matching the seed crystal substrates has two or more symmetries, when the substrate for crystal growth is rotated once, with an axis passing through a center of a main surface of the substrate for crystal growth and orthogonal to the main surface as a central axis.
Public/Granted literature
- US20170145591A1 SUBSTRATE FOR CRYSTAL GLOWTH, NITRIDE CRYSTAL SUBSTRATE AND MANUFACTURING METHOD OF THE SAME Public/Granted day:2017-05-25
Information query
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