- Patent Title: Substrate with antireflection coating and method for producing same
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Application No.: US14959411Application Date: 2015-12-04
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Publication No.: US10365409B2Publication Date: 2019-07-30
- Inventor: Christian Henn , Thorsten Damm
- Applicant: SCHOTT AG
- Applicant Address: DE Mainz
- Assignee: SCHOTT AG
- Current Assignee: SCHOTT AG
- Current Assignee Address: DE Mainz
- Agency: Ohlandt, Greeley, Ruggiero & Perle, L.L.P.
- Priority: DE102011012160 20110223; DE102012000997 20120120
- Main IPC: C03C17/34
- IPC: C03C17/34 ; C23C14/08 ; C23C14/18 ; C23C14/34 ; C23C14/35 ; G02B1/115 ; G02B1/116 ; H01J37/34

Abstract:
A substrate is provided with an abrasion resistance antireflection coating. The coated substrate includes a multilayer antireflection coating on at least one side. The coating has layers with different refractive indices, wherein higher refractive index layers alternate with lower refractive index layers. The layers having a lower refractive index are formed of silicon oxide with a proportion of aluminum, with a ratio of the amounts of aluminum to silicon is greater than 0.05, preferably greater than 0.08, but with the amount of silicon predominant relative to the amount of aluminum. The layers having a higher refractive index include a silicide, an oxide, or a nitride.
Public/Granted literature
- US20160091634A1 SUBSTRATE WITH ANTIREFLECTION COATING AND METHOD FOR PRODUCING SAME Public/Granted day:2016-03-31
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