Invention Grant
- Patent Title: Mass flow controller
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Application No.: US15758675Application Date: 2016-09-09
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Publication No.: US10365666B2Publication Date: 2019-07-30
- Inventor: Masashi Sonoda , Yuji Kishine
- Applicant: HITACHI METALS, LTD.
- Applicant Address: JP Tokyo
- Assignee: HITACHI METALS, LTD.
- Current Assignee: HITACHI METALS, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Neugeboren O'Dowd PC
- Priority: JP2015-179223 20150911
- International Application: PCT/JP2016/076681 WO 20160909
- International Announcement: WO2017/043648 WO 20170316
- Main IPC: G05D7/06
- IPC: G05D7/06 ; G01F1/00 ; G01F1/68 ; G01F15/02 ; G01F1/684 ; G01F1/84 ; G01F15/04 ; G01F15/00

Abstract:
A control means configured to perform flow rate control in which the control means outputs a control signal to a flow control valve to control a valve opening such that a measured flow rate of gas measured by a flow meter matches a set flow rate adjusts intensity of the control signal such that an absolute value of a change amount of the valve opening becomes larger as measured temperature of the gas measured by a thermometer becomes further higher than reference temperature, while the absolute value of the change amount of the valve opening becomes smaller as the measured temperature becomes further lower than the reference temperature. Thereby, change of response time on changing the valve opening of the flow control valve due to the difference between the measured temperature of the gas and the reference temperature can be reduced.
Public/Granted literature
- US20180275689A1 MASS FLOW CONTROLLER Public/Granted day:2018-09-27
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