Invention Grant
- Patent Title: Semiconductor device including transistors sharing gates
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Application No.: US15691725Application Date: 2017-08-30
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Publication No.: US10366992B2Publication Date: 2019-07-30
- Inventor: Yi-Feng Chang , Po-Lin Peng , Jam-Wem Lee
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Maschoff Brennan
- Main IPC: H01L27/092
- IPC: H01L27/092 ; H01L29/10 ; H01L27/02 ; H01L21/8238

Abstract:
A semiconductor device includes a first active area of a first type, a second active area of a second type, and a plurality of gates. The gates are arranged above and across the first active area and the second active area. At a first side of a first gate of the plurality of gates, a first region of the first active area is configured to receive a first voltage and a first region of the second active area is configured to receive a second voltage. At a second side of the first gate, a second region of the first active area is disconnected from the first voltage and a second region of the second active area is disconnected from the second voltage.
Public/Granted literature
- US20190067281A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2019-02-28
Information query
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