Invention Grant
- Patent Title: Array substrate and manufacturing method thereof
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Application No.: US15740009Application Date: 2017-11-30
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Publication No.: US10367017B2Publication Date: 2019-07-30
- Inventor: Hongyuan Xu
- Applicant: Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- Applicant Address: CN Shenzhen
- Assignee: Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- Current Assignee: Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- Current Assignee Address: CN Shenzhen
- Agent Mark M. Friedman
- Priority: CN201711171967 20171122
- International Application: PCT/CN2017/113698 WO 20171130
- International Announcement: WO2019/100428 WO 20190531
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L21/428 ; H01L29/66 ; H01L29/24 ; H01L29/786 ; H01L21/477

Abstract:
An array substrate and a method of manufacturing the array substrate are provided. The method includes providing a substrate, sequentially forming a light-shielding layer, a buffer layer, an active layer, a source, a drain, a gate insulating layer, and a gate on the substrate, performing a first conductorization process on a corresponding region of the active layer opposite to the source and the drain, and performing a second conductorization process on another corresponding region of the active layer between the source and the gate and between the drain and the gate.
Public/Granted literature
- US20190157316A1 ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF Public/Granted day:2019-05-23
Information query
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