Invention Grant
- Patent Title: Matrix for letters or patterns on fabric
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Application No.: US15610985Application Date: 2017-06-01
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Publication No.: US10370786B2Publication Date: 2019-08-06
- Inventor: Yong Chong Kim
- Applicant: Yong Chong Kim
- Agency: Park Law Firm
- Agent John K. Park
- Main IPC: D06C23/00
- IPC: D06C23/00 ; A41F1/00 ; A41F1/02 ; A41D27/08 ; B44F1/08 ; B44C1/28

Abstract:
A matrix for fabric includes engaging portions and decorating portions. The engaging portions are disposed over a surface area of the fabric. The decorating portions are installed at the engaging portions. The decorating portions form letters or patterns on the specific surface area of the fabric. The engaging portions may be aligned so as to form a lattice. Eyes of the lattice may be triangular, rectangular, or hexagonal. Each of the engaging portions may have a hole through the fabric. The engaging portions may include eyelets, each of which being fixed to the hole at an external perimeter of the eyelet.
Public/Granted literature
- US20180263323A1 Matrix for Letters or Patterns on Fabric Public/Granted day:2018-09-20
Information query