Invention Grant
- Patent Title: Hybrid interconnect device and method
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Application No.: US15885450Application Date: 2018-01-31
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Publication No.: US10371893B2Publication Date: 2019-08-06
- Inventor: Chen-Hua Yu , Chuei-Tang Wang , Hsing-Kuo Hsia , Yu-Kuang Liao , Chih-Chieh Chang
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Slater Matsil, LLP
- Main IPC: G02B6/124
- IPC: G02B6/124 ; G02B6/136 ; H05K1/11 ; H05K1/02 ; H05K1/18

Abstract:
In an embodiment, a method includes: forming an interconnect including waveguides and conductive features disposed in a plurality of dielectric layers, the conductive features including conductive lines and vias, the waveguides formed of a first material having a first refractive index, the dielectric layers formed of a second material having a second refractive index less than the first refractive index; bonding a plurality of dies to a first side of the interconnect, the dies electrically connected by the conductive features, the dies optically connected by the waveguides; and forming a plurality of conductive connectors on a second side of the interconnect, the conductive connectors electrically connected to the dies by the conductive features.
Public/Granted literature
- US20190162901A1 Hybrid Interconnect Device and Method Public/Granted day:2019-05-30
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