Invention Grant
- Patent Title: Constructing fill shapes for double-patterning technology
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Application No.: US14929113Application Date: 2015-10-30
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Publication No.: US10372037B2Publication Date: 2019-08-06
- Inventor: Himanshu Sharma , Byungwook Kim , Virender Kashyap , Abhishek Khandelwal
- Applicant: Synopsys, Inc.
- Applicant Address: US CA Mountain View
- Assignee: SYNOPSYS, INC.
- Current Assignee: SYNOPSYS, INC.
- Current Assignee Address: US CA Mountain View
- Agency: Alston & Bird LLP
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G03F7/00 ; G03F1/68 ; G03F1/70 ; G03F7/20

Abstract:
A computer-implemented method for constructing a design characterized by a double patterning layer is presented. The method includes receiving the design in a memory of the computer when the computer is invoked to construct the design. The method further includes generating, using the computer, a multitude of fill shapes along a multitude of tracks associated with a multitude of net shapes. The multitude of fill shapes and the multitude of net shapes are decomposable into two colors in accordance with a spacing constraint of the double patterning layer.
Public/Granted literature
- US20170124242A1 CONSTRUCTING FILL SHAPES FOR DOUBLE-PATTERNING TECHNOLOGY Public/Granted day:2017-05-04
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