Invention Grant
- Patent Title: Hotspot aware dose correction
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Application No.: US15534391Application Date: 2015-12-11
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Publication No.: US10372043B2Publication Date: 2019-08-06
- Inventor: Gang Chen , Te-Sheng Wang
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- International Application: PCT/EP2015/079467 WO 20151211
- International Announcement: WO2016/096668 WO 20160623
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic apparatus, the method including: obtaining a relationship of a characteristic of one or more features in the portion with respect to dose; obtaining a value of the characteristic; and obtaining a target dose based on the value of the characteristic and the relationship.
Public/Granted literature
- US20180259858A1 HOTSPOT AWARE DOSE CORRECTION Public/Granted day:2018-09-13
Information query
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