Invention Grant
- Patent Title: Thin-film transistor array substrate and manufacturing method thereof
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Application No.: US15834077Application Date: 2017-12-07
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Publication No.: US10373989B2Publication Date: 2019-08-06
- Inventor: Xiaowen Lv , Chihyu Su
- Applicant: Shenzhen China Star Optoelectronics Technology Co., Ltd.
- Applicant Address: CN Shenzhen, Guangdong
- Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Shenzhen, Guangdong
- Agent Leong C. Lei
- Priority: CN201510206100 20150427
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L21/77 ; H01L21/4757 ; H01L29/423 ; H01L29/49 ; H01L29/786 ; H01L29/51

Abstract:
A thin-film transistor (TFT) array substrate includes a TFT arrangement and a storage capacitor. A gate insulation layer has a portion interposed between two electrode plates of the storage capacitor and thinner than a remaining portion of the gate insulation layer and thus, the thickness of insulation between the electrode plates of the storage capacitor is reduced so that the area of the opposite surfaces of the capacitor can be made smaller and an increased aperture ratio can be achieved.
Public/Granted literature
- US20180097020A1 THIN-FILM TRANSISTOR ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF Public/Granted day:2018-04-05
Information query
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