- Patent Title: Phase change memory structure and manufacturing method for the same
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Application No.: US15792370Application Date: 2017-10-24
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Publication No.: US10374010B2Publication Date: 2019-08-06
- Inventor: Jau-Yi Wu
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT, P.C., Intellectual Property Attorneys
- Agent Anthony King
- Main IPC: H01L47/00
- IPC: H01L47/00 ; H01L27/24 ; G11C13/00 ; H01L45/00

Abstract:
Present disclosure provides a phase change memory structure, including a transistor region, a phase change material over the transistor region, a heater over the transistor region and in contact with the phase change material, and a dielectric layer surrounding the heater and the phase change material. The heater includes a first material having a first thermal conductivity, the first material disposed at a periphery of the heater, and a second material having a second thermal conductivity greater than the first thermal conductivity, the second material disposed at a center of the heater. Present disclosure also provides a method for manufacturing the phase change memory structure described herein.
Public/Granted literature
- US20190123103A1 PHASE CHANGE MEMORY STRUCTURE AND MANUFACTURING METHOD FOR THE SAME Public/Granted day:2019-04-25
Information query
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