Invention Grant
- Patent Title: Method of two-stage FRM filter
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Application No.: US15320251Application Date: 2014-06-19
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Publication No.: US10374579B2Publication Date: 2019-08-06
- Inventor: Ying Wei , Shaoguang Huang
- Applicant: SHANDONG UNIVERSITY
- Applicant Address: CN Jinan
- Assignee: SHANDONG UNIVERSITY
- Current Assignee: SHANDONG UNIVERSITY
- Current Assignee Address: CN Jinan
- Agency: Oliff PLC
- Priority: CN201410247784 20140605
- International Application: PCT/CN2014/080316 WO 20140619
- International Announcement: WO2015/184657 WO 20151210
- Main IPC: H03H17/02
- IPC: H03H17/02 ; H03H17/06

Abstract:
An improved design method of a two-stage FRM filter includes the following steps: constructing an improved two-stage FRM filter; calculating passband and stopband edge parameters of a prototype filter, passband and stopband edge parameters of a second-stage masking filter and passband and stopband edge parameters of a first-stage masking filter in Case A and Case B, respectively; calculating the complexity of the FRM filter according to the obtained parameters, and finding out one or more sets [M, P, Q] having the lowest complexity within a search range; and optimizing the improved FRM filter. The improved design method of a two-stage FRM filter has the following beneficial effect: as compared to a conventional design method of a two-stage FRM filter, the complexity of a narrow-band FIR (Finite Impulse Response) filter can be reduced through design using the improved method, and power consumption is thus reduced in hardware implementation.
Public/Granted literature
- US20170149416A1 IMPROVED DESIGN METHOD OF TWO-STAGE FRM FILTER Public/Granted day:2017-05-25
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