Invention Grant
- Patent Title: Metrology method, target and substrate
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Application No.: US16174398Application Date: 2018-10-30
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Publication No.: US10379445B2Publication Date: 2019-08-13
- Inventor: Martin Jacobus Johan Jak , Arie Jeffrey Den Boef , Martin Ebert
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP15202372 20151223
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03F7/20 ; G01B11/26 ; G01N21/95 ; G01N21/21 ; G01N21/47 ; G02B5/18 ; G03F9/00 ; G02B27/42

Abstract:
A method, involving illuminating at least a first periodic structure of a metrology target with a first radiation beam having a first polarization, illuminating at least a second periodic structure of the metrology target with a second radiation beam having a second different polarization, combining radiation diffracted from the first periodic structure with radiation diffracted from the second periodic structure to cause interference, detecting the combined radiation using a detector, and determining a parameter of interest from the detected combined radiation.
Public/Granted literature
- US20190064677A1 METROLOGY METHOD, TARGET AND SUBSTRATE Public/Granted day:2019-02-28
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