- Patent Title: High voltage bipolar structure for improved pulse width scalability
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Application No.: US15173360Application Date: 2016-06-03
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Publication No.: US10381342B2Publication Date: 2019-08-13
- Inventor: Yang Xiu , Aravind C Appaswamy , Akram Salman , Mariano Dissegna
- Applicant: Texas Instruments Incorporated
- Applicant Address: US TX Dallas
- Assignee: TEXAS INSTRUMENTS INCORPORATED
- Current Assignee: TEXAS INSTRUMENTS INCORPORATED
- Current Assignee Address: US TX Dallas
- Agent Rose Alyssa Keagy; Charles A. Brill; Frank D. Cimino
- Main IPC: H01L27/02
- IPC: H01L27/02 ; H01L29/06 ; H01L29/41 ; H01L29/73 ; H01L29/417 ; H01L29/732

Abstract:
According to an embodiment, a bipolar transistor is disclosed for Electrostatic discharge (ESD) management in integrated circuits. The bipolar transistor enables vertical current flow in a bipolar transistor cell configured for ESD protection. The bipolar transistor includes a selectively embedded P-type floating buried layer (PBL). The floating P-region is added in a standard NPN cell. During an ESD event, the base of the bipolar transistor extends to the floating P-region with a very small amount of current. The PBL layer can provide more holes to support the current resulting in decreased holding voltage of the bipolar transistor. With the selective addition of floating P-region, the current scalability of the bipolar transistor at longer pulse widths can be significantly improved.
Public/Granted literature
- US20170098643A1 HIGH VOLTAGE BIPOLAR STRUCTURE FOR IMPROVED PULSE WIDTH SCALABILITY Public/Granted day:2017-04-06
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