Invention Grant
- Patent Title: Device and method of manufacturing high-aspect ratio structures
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Application No.: US15120232Application Date: 2015-02-20
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Publication No.: US10381651B2Publication Date: 2019-08-13
- Inventor: Sandeep Unnikrishnan , Philippe Vereecken
- Applicant: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO , IMEC vzw
- Applicant Address: NL ′s-Gravenhage BE Leuven
- Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO,IMEC vzw
- Current Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO,IMEC vzw
- Current Assignee Address: NL ′s-Gravenhage BE Leuven
- Agency: Banner & Witcoff, Ltd.
- Priority: EP14156170 20140221; EP14156208 20140221; EP14163546 20140404; EP14163570 20140404
- International Application: PCT/NL2015/050107 WO 20150220
- International Announcement: WO2015/126248 WO 20150827
- Main IPC: H01M4/70
- IPC: H01M4/70 ; H01M4/04 ; H01M4/66 ; H01M10/04 ; H01M10/0562 ; H01M10/0585 ; H01M6/40 ; H01M10/0525 ; H01G9/20 ; H01M10/052 ; H01L31/0224

Abstract:
An method for manufacturing a electronic device is provided having a current collector capable of a high specific charge collecting area and power, but is also achieved using a simple and fast technique and resulting in a robust design that may be flexed and can be manufactured in large scale processing. To this end the electronic device comprising an electronic circuit equipped with a current collector formed by a metal substrate having a face forming a high-aspect ratio structure of pillars having an interdistance larger than 600 nm. By forming the high-aspect structure in a metal substrate, new structures can be formed that are conformal to curvature of a macroform or that can be coiled or wound and have a robust design.
Public/Granted literature
- US20170062834A1 A DEVICE AND METHOD OF MANUFACTURING HIGH-ASPECT RATIO STRUCTURES Public/Granted day:2017-03-02
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