Invention Grant
- Patent Title: Profile adjustment system, profile adjustment device, and profile adjustment method
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Application No.: US16180075Application Date: 2018-11-05
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Publication No.: US10395619B2Publication Date: 2019-08-27
- Inventor: Mitsuhiro Yamashita
- Applicant: SEIKO EPSON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2017-213525 20171106
- Main IPC: G09G5/02
- IPC: G09G5/02 ; H04N1/60 ; G06F3/0482 ; G06F3/0486 ; G06F3/12 ; G06F3/0484

Abstract:
A profile adjustment system displays, in a display device 115, an input field of a coordinate of an adjustment point P0 disposed on a color space, and includes an adjustment coordinate reception unit U1, an adjustment influence range reception unit U3, a linking configuration reception unit U4, a linking configuration display processing unit UA, an adjustment coordinate configuration unit U5, an adjustment influence range configuration unit U6, a whole adjustment influence range display processing unit UB configured to display, in the display device 115, a whole adjustment influence range including U3, U4, U5, and U6, and a profile adjustment unit U7 configured to adjust a profile based on all adjustment points P0 configured in the adjustment coordinate reception unit U1 and an adjustment point Qx added by the adjustment coordinate configuration unit U5.
Public/Granted literature
- US20190139511A1 PROFILE ADJUSTMENT SYSTEM, PROFILE ADJUSTMENT DEVICE, AND PROFILE ADJUSTMENT METHOD Public/Granted day:2019-05-09
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