Invention Grant
- Patent Title: Plasma processing apparatus
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Application No.: US15415403Application Date: 2017-01-25
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Publication No.: US10395900B2Publication Date: 2019-08-27
- Inventor: Hak Young Kim , Jung Pyo Hong , Jong Woo Sun , Doug Yong Sung , Yong Ho Lim , Yun Kwang Jeon , Hwa Jun Jung
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel, P.A.
- Priority: KR10-2016-0075871 20160617
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01L21/67

Abstract:
A plasma processing apparatus includes a chamber, a window plate disposed in an upper portion of the chamber and having a fastening hole defined therein, an injector having a body part including a plurality of nozzles and configured to be fastened to the fastening hole, and a flange part extending radially from the body part to partially cover a bottom surface of the window plate when the body part is fastened to the fastening hole, and a stopper configured to be fastened to the body part on an upper surface of the window plate to hold the injector in the fastening hole when the body part is fastened to the fastening hole.
Public/Granted literature
- US20170365444A1 Plasma Processing Apparatus Public/Granted day:2017-12-21
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