Invention Grant
- Patent Title: Nozzle plate, liquid ejecting head, liquid ejecting apparatus, and manufacturing method of nozzle plate
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Application No.: US16016741Application Date: 2018-06-25
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Publication No.: US10399339B2Publication Date: 2019-09-03
- Inventor: Osamu Tonomura , Satoshi Suzuki
- Applicant: Seiko Epson Corporation
- Applicant Address: JP
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: JP2017-123993 20170626
- Main IPC: B41J2/14
- IPC: B41J2/14 ; B41J2/16
Abstract:
A nozzle plate is a nozzle plate provided with a plurality of nozzle openings, in which a DLC film is provided on a base material (silicon substrate) of the nozzle plate, the DLC film contains fluorine, a fluorine concentration in the DLC film decreases in a direction from a surface of the DLC film toward the silicon substrate, and a fluorine concentration in a region along the nozzle opening is lower than a fluorine concentration in the surface of the DLC film (surface of flat portion).
Public/Granted literature
- US20180370232A1 NOZZLE PLATE, LIQUID EJECTING HEAD, LIQUID EJECTING APPARATUS, AND MANUFACTURING METHOD OF NOZZLE PLATE Public/Granted day:2018-12-27
Information query
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