- Patent Title: Defect observation method and device and defect detection device
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Application No.: US15317065Application Date: 2015-05-27
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Publication No.: US10401300B2Publication Date: 2019-09-03
- Inventor: Yuko Otani , Yuta Urano , Toshifumi Honda
- Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge PC
- Priority: JP2014-131382 20140626
- International Application: PCT/JP2015/065318 WO 20150527
- International Announcement: WO2015/198781 WO 20151230
- Main IPC: G01B21/00
- IPC: G01B21/00 ; G01N21/88 ; G01B11/30 ; G01N21/956 ; G01B11/06 ; G01N21/95 ; G01N23/2251 ; G02B21/00 ; G02B21/10 ; G02B21/26 ; G02B27/09 ; G02B27/58 ; G01B15/08 ; G01B11/25 ; G03F7/20

Abstract:
A defect observation method for observing a defect on a sample detected by another inspection device with a scanning electron microscope including the steps of: optically detecting the defect using the position information for the defect: illuminating the sample including the defect with an illumination intensity pattern having periodic intensity variation in two dimensions by irradiating a plurality of illumination light beams onto the surface of the sample while phase modulating the light beams in a single direction and successively moving the light beams in small movements in a direction different from the single direction, imaging the surface of the sample that is illuminated by the illumination intensity pattern having periodic intensity variation in two dimensions and includes the defect detected by the other inspection device, and detecting the defect detected by the other inspection device from the image obtained through the imaging of the surface of the sample.
Public/Granted literature
- US20170108444A1 DEFECT OBSERVATION METHOD AND DEVICE AND DEFECT DETECTION DEVICE Public/Granted day:2017-04-20
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