In order to meet the needs of the semi-conductor industry as it requires finer lithography nodes, a method of feedback control for scanning probe microscopy generates a microwave frequency comb of harmonics in a tunneling junction by irradiating the junction with mode-locked pulses of electromagnetic radiation. Utilizing power measurements within one or more harmonics, the tip-sample distance in the tunneling junction may be regulated for maximum efficiency and avoid tip crash when used with resistive samples. Optionally, no DC bias is required to use the method. Utilization of this method contributes to true sub-nanometer resolution of images of carrier distribution in resistive samples such as semi-conductors.