Invention Grant
- Patent Title: Resist composition and method of forming resist pattern
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Application No.: US15697033Application Date: 2017-09-06
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Publication No.: US10401727B2Publication Date: 2019-09-03
- Inventor: Takashi Nagamine , Tsuyoshi Nakamura
- Applicant: TOKYO OHKA KOGYO CO., LTD.
- Applicant Address: JP Kawasaki-Shi
- Assignee: TOKYO OHKA KOGYO CO., LTD.
- Current Assignee: TOKYO OHKA KOGYO CO., LTD.
- Current Assignee Address: JP Kawasaki-Shi
- Agency: Knobbe, Martens, Olson & Bear LLP
- Priority: JP2016-183517 20160920
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/26 ; C08F220/26 ; H01L21/027 ; C08F220/18 ; C08F220/38 ; G03F7/039 ; G03F7/20 ; G03F7/32

Abstract:
A resist composition including a polymeric compound having 0 to 20 mol % of a structural unit containing a polar group-containing aliphatic hydrocarbon group, and an acid generator compound represented by general formula (b1-1) in which R101 represents a hydrocarbon group having at least 1 hydroxy group as a substituent; Y101 represents a single bond or a divalent linking group containing an oxygen atom; V101 represents a single bond, an alkylene group or a fluorinated alkylene group; R102 represents a fluorine atom or a fluorinated alkyl group of 1 to 5 carbon atoms; M′m+ represents an organic cation having a valency of m.
Public/Granted literature
- US20180081269A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN Public/Granted day:2018-03-22
Information query
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