Invention Grant
- Patent Title: Lithographic method and apparatus
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Application No.: US15750020Application Date: 2016-07-25
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Publication No.: US10401734B2Publication Date: 2019-09-03
- Inventor: Robbert Jan Voogd , Wilhelmus Jacobus Maria Rooijakkers
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP15181900 20150821
- International Application: PCT/EP2016/067615 WO 20160725
- International Announcement: WO2017/032525 WO 20170302
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
An illumination system (IL) for a lithographic apparatus comprising a polarization adjustment apparatus (15) arranged to receive linearly polarized radiation, the polarization adjustment apparatus comprising regions which are configured to rotate the polarization orientation by different amounts, a directing apparatus (6) operable to direct the radiation through one or more regions of the polarization adjustment apparatus, a controller (CN) configured to control the directing apparatus so as to control which of the one or more regions of the polarization adjustment apparatus radiation is directed through, wherein the controller is configured to limit which of the regions radiation is directed through to one or more regions which rotate the orientation of the linear polarization by substantially the same amount, and a diffuser configured to receive radiation output from the polarization adjustment apparatus and increase a range of angles at which the radiation propagates while substantially conserving the polarization state of the radiation.
Public/Granted literature
- US20180224751A1 Lithographic Method and Apparatus Public/Granted day:2018-08-09
Information query
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