A plasma containment system comprises a chamber, a magnetic field generator, and an annular plasma layer that comprises a circulating beam of ions. The chamber includes axial insulating breaks in the chamber wall that run along almost the entire length of the chamber. An inductive plasma source is mountable within the chamber and includes a shock coil assembly and a Laval nozzle to introduce gas into the inductive plasma source. A RF drive comprises a quadrupolar cyclotron located within the chamber and having four azimuthally symmetrical electrodes with gaps there between.