Invention Grant
- Patent Title: Thick film resistor and production method for same
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Application No.: US15842267Application Date: 2017-12-14
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Publication No.: US10403421B2Publication Date: 2019-09-03
- Inventor: Hiroshi Mashima , Yukari Morofuji
- Applicant: Shoei Chemical Inc.
- Applicant Address: JP Shinjuku-ku, Tokyo
- Assignee: SHOEI CHEMICAL INC.
- Current Assignee: SHOEI CHEMICAL INC.
- Current Assignee Address: JP Shinjuku-ku, Tokyo
- Agency: Flynn Thiel, P.C.
- Priority: JP2014-185800 20140912
- Main IPC: H01B1/08
- IPC: H01B1/08 ; H01C7/00 ; H01B1/20 ; H01B1/14 ; C03C3/089 ; C03C4/14 ; C03C8/02 ; C03C8/18 ; C09D11/03 ; C09D11/52 ; H01C17/065 ; C03C3/068 ; C03C3/072 ; C03C3/074 ; C03C3/085 ; C03C3/087 ; C03C3/091 ; C03C3/093 ; C03C3/105 ; C03C3/108 ; C03C8/04 ; C03C8/10 ; C03C8/22 ; C09D11/037 ; H01C7/06 ; H01C7/02

Abstract:
A thick film resistor excluding a toxic lead component from a conductive component and glass and having characteristics equivalent to or superior to conventional resistors in terms of, in a wide resistance range, resistance values, TCR characteristics, current noise characteristics, withstand voltage characteristics and the like. The thick film resistor is formed of a fired product of a resistive composition, wherein the thick film resistor contains ruthenium-based conductive particles containing ruthenium dioxide and a glass component essentially free of a lead component and has a resistance value in the range of 100 Ω/□ to 10 MΩ/□ and a temperature coefficient of resistance within ±100 ppm/° C.
Public/Granted literature
- US20180108460A1 THICK FILM RESISTOR AND PRODUCTION METHOD FOR SAME Public/Granted day:2018-04-19
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