Invention Grant
- Patent Title: Wafer processing method
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Application No.: US15977418Application Date: 2018-05-11
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Publication No.: US10403490B2Publication Date: 2019-09-03
- Inventor: Kazuma Sekiya
- Applicant: DISCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Disco Corporation
- Current Assignee: Disco Corporation
- Current Assignee Address: JP Tokyo
- Agency: Greer Burns & Crain, Ltd.
- Priority: JP2017-094916 20170511
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/683 ; H01L21/67 ; B24B7/22

Abstract:
A wafer processing method includes a close contact making step of pressing a protective film against the front side of a wafer in a radially outward direction starting from the center of the wafer to thereby bring the protective film into close contact with the front side of the wafer, a protective member fixing step of covering the protective film with a protective member formed by curing a liquid resin to thereby fix the protective member through the protective film to the front side of the wafer, a grinding step of grinding the back side of the wafer to reduce the thickness of the wafer, and a peeling step of peeling the protective film and the protective member from the wafer thinned by the grinding step.
Public/Granted literature
- US20180330938A1 WAFER PROCESSING METHOD Public/Granted day:2018-11-15
Information query
IPC分类: