Invention Grant
- Patent Title: High-purity dispense system
-
Application No.: US15675383Application Date: 2017-08-11
-
Publication No.: US10403501B2Publication Date: 2019-09-03
- Inventor: Anton J. deVilliers , Rodney L. Robison , Ronald Nasman , David Travis , James Grootegoed , Norman A. Jacobson, Jr. , Lior Huli , Joshua S. Hooge
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: B05C11/10
- IPC: B05C11/10 ; H01L21/02 ; H01L21/027 ; B05B15/55 ; H01L21/67 ; B05C5/02

Abstract:
Techniques herein include a bladder-based dispense system using an elongate bladder configured to selectively expand and contract to assist with dispense actions. This dispense system compensates for filter-lag, which often accompanies fluid filtering for microfabrication. This dispense system also provides a high-purity and high precision dispense unit. A process fluid filter is located downstream from a process fluid source as well as a system valve. Downstream from the process fluid filter there are no valves. Dispense actions can be initiated and stop while the system valve is open by using the elongate bladder. The elongate bladder can be expanded to stop or pause a dispense action, and then be contracted to assist with a dispense action.
Public/Granted literature
- US20180047562A1 High-Purity Dispense System Public/Granted day:2018-02-15
Information query