Invention Grant
- Patent Title: Gallium nitride/ aluminum gallium nitride semiconductor device and method of making a gallium nitride/ aluminum gallium nitride semiconductor device
-
Application No.: US15356509Application Date: 2016-11-18
-
Publication No.: US10403747B2Publication Date: 2019-09-03
- Inventor: Godefridus Adrianus Maria Hurkx , Johannes Josephus Theodorus Marinus Donkers , Jan Sonsky , Jeroen Antoon Croon
- Applicant: Nexperia B.V.
- Applicant Address: NL Nijmegen
- Assignee: Nexperia B.V.
- Current Assignee: Nexperia B.V.
- Current Assignee Address: NL Nijmegen
- Agency: Ohlandt, Greeley, Ruggiero & Perle, L.L.P.
- Priority: EP15196730 20151127
- Main IPC: H01L29/778
- IPC: H01L29/778 ; H01L29/20 ; H01L29/423 ; H01L29/66 ; H01L29/872 ; H01L29/40 ; H01L29/417 ; H01L29/45

Abstract:
A semiconductor device and a method of making the same is disclosed. The device includes a substrate having an AlGaN layer located on a GaN layer for forming a two dimensional electron gas at an interface between the AlGaN layer and the GaN layer. The device also includes a plurality of contacts. At least one of the contacts includes an ohmic contact portion located on a major surface of the substrate. The ohmic contact portion comprises a first electrically conductive material. The at least one of the contacts also includes a trench extending down into the substrate from the major surface. The trench passes through the AlGaN layer and into the GaN layer. The trench is at least partially filled with a second electrically conductive material. The second electrically conductive material is a different electrically conductive material to the first electrically conductive material.
Public/Granted literature
- US20170154988A1 SEMICONDUCTOR DEVICE AND METHOD OF MAKING A SEMICONDUCTOR DEVICE Public/Granted day:2017-06-01
Information query
IPC分类: