Invention Grant
- Patent Title: Method for removing vapors generated by processing device
-
Application No.: US15687615Application Date: 2017-08-28
-
Publication No.: US10406474B2Publication Date: 2019-09-10
- Inventor: Li-Chin Lu , Jian-Hua Xiang
- Applicant: Fu Tai Hua Industry (Shenzhen) Co., Ltd. , HON HAI PRECISION INDUSTRY CO., LTD.
- Applicant Address: CN Shenzhen TW New Taipei
- Assignee: Fu Tai Hua Industry (Shenzhen) Co., Ltd.,HON HAI PRECISION INDUSTRY CO., LTD.
- Current Assignee: Fu Tai Hua Industry (Shenzhen) Co., Ltd.,HON HAI PRECISION INDUSTRY CO., LTD.
- Current Assignee Address: CN Shenzhen TW New Taipei
- Agency: ScienBiziP, P.C.
- Priority: CN201710429530 20170608
- Main IPC: B01D53/04
- IPC: B01D53/04 ; B30B15/00

Abstract:
A method for removing vapors generated by a processing device presenting reduced risk to human handlers includes placing a vapor removing device in a feed area of the processing device. The vapor removing device includes a connecting plate and at least one vapor removing element each connected to one surface of the connecting plate. The vapor removing device is lifted robotically from the feed area and placed into the processing device. Then, the vapor removing element directly removes vapors generated by the processing device when the processing device starts to work, the device being robotically taken out of the processing device and placed back in the feed area.
Public/Granted literature
- US20180353894A1 METHOD FOR REMOVING VAPORS GENERATED BY PROCESSING DEVICE Public/Granted day:2018-12-13
Information query
IPC分类: