Invention Grant
- Patent Title: Inspection method and inspection apparatus
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Application No.: US16003655Application Date: 2018-06-08
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Publication No.: US10410335B2Publication Date: 2019-09-10
- Inventor: Riki Ogawa , Masatoshi Hirono
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Yokohama
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Yokohama
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2013-029453 20130218
- Main IPC: H04N7/18
- IPC: H04N7/18 ; G06T7/00

Abstract:
An inspection method and apparatus comprising, a step of reflecting linearly-polarized light having a predetermined wavelength using an non-polarizing beam splitter after transmitting the linearly-polarized light through a half-wave plate, irradiating a sample with the linearly-polarized light having a polarization plane of a predetermined angle, causing the light reflected by the sample to be incident to an image capturing sensor through a lens, the non-polarizing beam splitter, and an analyzer, and acquiring an optical image of a pattern formed on the sample; acquiring a plurality of optical images by changing an angle of the analyzer or the half-wave plate, and obtaining an angle of the analyzer or the half-wave plate such that a value of (σ/√A) becomes a minimum; and a step of inspecting whether a defect of the pattern exists, wherein the pattern is a repetitive pattern having a period at a resolution limit or less.
Public/Granted literature
- US20180293724A1 INSPECTION METHOD AND INSPECTION APPARATUS Public/Granted day:2018-10-11
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