Invention Grant
- Patent Title: Apparatus and method for processing gas, and storage medium
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Application No.: US15629027Application Date: 2017-06-21
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Publication No.: US10410876B2Publication Date: 2019-09-10
- Inventor: Jun Yamashita
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Nath, Goldberg & Meyer
- Agent Jerald L. Meyer
- Priority: JP2016-125587 20160624
- Main IPC: H01L21/311
- IPC: H01L21/311 ; H01J37/32 ; H01L21/02
Abstract:
An apparatus for processing a gas includes: a mounting part installed in a processing container and on which a substrate is mounted; a first gas flow path where a first gas is supplied from a first gas supply mechanism to an upstream portion of the first gas flow path, and a downstream portion of the first gas flow path is branched to form first branch paths; a second gas flow path where a second gas is supplied from a second gas supply mechanism to an upstream portion of the second gas flow path, and a downstream portion of the second gas flow path is branched to form second branch paths; an annular mixing chamber to which a discharge path is connected; and a gas discharge part discharging a mixture gas.
Public/Granted literature
- US20170372914A1 Apparatus and Method for Processing Gas, and Storage Medium Public/Granted day:2017-12-28
Information query
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