Invention Grant
- Patent Title: High performance compliant substrate
-
Application No.: US15592973Application Date: 2017-05-11
-
Publication No.: US10410977B2Publication Date: 2019-09-10
- Inventor: Cyprian Emeka Uzoh , Rajesh Katkar
- Applicant: Invensas Corporation
- Applicant Address: US CA San Jose
- Assignee: Invensas Corporation
- Current Assignee: Invensas Corporation
- Current Assignee Address: US CA San Jose
- Main IPC: H01M2/08
- IPC: H01M2/08 ; H01M2/16 ; H01M2/18 ; H01M4/02 ; H01M4/04 ; H01M4/52 ; H01M4/80 ; H01M4/485 ; H05K1/00 ; H05K3/10 ; H05K3/40 ; H05K3/46 ; H01L23/00 ; H01L21/48 ; H01L23/498 ; H01L23/538 ; H05K1/02 ; H05K1/03 ; H01L23/15

Abstract:
A substrate structure is presented that can include a porous polyimide material and electrodes formed in the porous polyimide material. In some examples, a method of forming a substrate can include depositing a barrier layer on a substrate; depositing a resist over the barrier layer; patterning and etching the resist; forming electrodes; removing the resist; depositing a porous polyimide aerogel; depositing a dielectric layer over the aerogel material; polishing a top side of the interposer to expose the electrodes; and removing the substrate from the bottom side of the interposer.
Public/Granted literature
- US20170250140A1 High Performance Compliant Substrate Public/Granted day:2017-08-31
Information query