Invention Grant
- Patent Title: Intelligent diode structures
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Application No.: US15938496Application Date: 2018-03-28
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Publication No.: US10411005B2Publication Date: 2019-09-10
- Inventor: Yi-Feng Chang , Jam-Wem Lee , Li-Wei Chu , Po-Lin Peng
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L29/861 ; H01L27/02 ; H01L27/08

Abstract:
The present disclosure describes exemplary configurations and arrangements for various intelligent diodes. The intelligent diodes of the present disclosure can be implemented as part of electrostatic discharge protection circuitry to protect other electronic circuitry from the flow of electricity caused by electrostatic discharge events. The electrostatic discharge protection circuitry dissipates one or more unwanted transient signals which result from the electrostatic discharge event. In some situations, some carrier electrons and/or carrier holes can flow from intelligent diodes of the present disclosure into a semiconductor substrate. The exemplary configurations and arrangements described herein include various regions designed collect these carrier electrons and/or carrier holes to reduce the likelihood these carrier electrons and/or carrier holes cause latch-up of the other electronic circuitry.
Public/Granted literature
- US20190148355A1 Intelligent Diode Structures Public/Granted day:2019-05-16
Information query
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