- Patent Title: Array substrate, manufacturing method thereof and display device
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Application No.: US15541363Application Date: 2017-05-25
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Publication No.: US10411047B2Publication Date: 2019-09-10
- Inventor: Songshan Li , Yuan-Jun Hsu , Zhaosong Liu
- Applicant: Shenzhen China Star Optoelectronics Technology Co., Ltd.
- Applicant Address: CN Shenzhen, Guangdong
- Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd
- Current Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd
- Current Assignee Address: CN Shenzhen, Guangdong
- Agent Andrew C. Cheng
- Priority: CN201710295367 20170428
- International Application: PCT/CN2017/085852 WO 20170525
- International Announcement: WO2018/196075 WO 20181101
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/425 ; H01L27/12 ; H01L29/08 ; H01L21/426 ; H01L29/66 ; H01L29/786

Abstract:
This disclosure discloses an array substrate and a manufacturing method, and a display device, the array substrate including: a channel layer; a gate insulating layer including a first portion and a second portion connected side by side, arranged on the channel layer, and exposing a source and drain contact zone on the channel layer, the second portion of the gate insulating layer being located on both sides of the first portion of the gate insulating layer; a gate layer, disposed on the first portion of the gate insulating layer; and a source and a drain, correspondingly connected to the contact region of the source and drain of the channel layer respectively. The array substrate of this disclosure solves the array substrate leakage problem caused by conductorizing the channel layer due to performing ion implantation to the channel layer.
Public/Granted literature
- US20180315778A1 ARRAY SUBSTRATE, MANUFACTURING METHOD THEREOF AND DISPLAY DEVICE Public/Granted day:2018-11-01
Information query
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