Invention Grant
- Patent Title: Semiconductor device for reduced on-state resistance
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Application No.: US16013496Application Date: 2018-06-20
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Publication No.: US10411099B2Publication Date: 2019-09-10
- Inventor: Tsuneo Ogura , Tomoko Matsudai
- Applicant: KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP Tokyo
- Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee Address: JP Tokyo
- Agency: Kim & Stewart LLP
- Priority: JP2016-050055 20160314
- Main IPC: H01L29/36
- IPC: H01L29/36 ; H01L29/739 ; H03K17/06 ; H01L29/10 ; H01L29/06 ; H01L29/08

Abstract:
A semiconductor device includes first and second electrodes spaced apart along a first direction, a first semiconductor region of a first conductivity type between the first and second electrodes, first and second conductive regions between the first semiconductor region and the second electrode and electrically connected to the second electrode, a third electrode between the first and second conductive regions, second and third semiconductor regions of a second conductivity type respectively between the first and second conductive regions and the third electrode, and fourth and fifth semiconductor regions of the first conductivity type respectively between the second and third semiconductor regions and the second electrode. The third electrode extends in the first direction toward the first electrode farther than portions of the second and third semiconductor regions that are alongside the third electrode.
Public/Granted literature
- US20180301538A1 SEMICONDUCTOR DEVICE Public/Granted day:2018-10-18
Information query
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