Invention Grant
- Patent Title: Crystallization method for oxide semiconductor layer, semiconductor device manufactured using the same, and method for manufacturing the semiconductor device
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Application No.: US15934360Application Date: 2018-03-23
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Publication No.: US10411134B2Publication Date: 2019-09-10
- Inventor: Min-Cheol Kim , Youn-Gyoung Chang , Kwon-Shik Park , So-Hyung Lee , Ho-Young Jung , Ha-Jin Yoo , Jeong-Suk Yang
- Applicant: LG DISPLAY CO., LTD.
- Applicant Address: KR Seoul
- Assignee: LG DISPLAY CO., LTD.
- Current Assignee: LG DISPLAY CO., LTD.
- Current Assignee Address: KR Seoul
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: KR10-2014-0175686 20141209
- Main IPC: H01L29/786
- IPC: H01L29/786 ; H01L21/02 ; H01L21/477 ; H01L29/10 ; H01L29/66

Abstract:
A display device includes a gate electrode on a substrate of a semiconductor device, a gate insulating film over the gate electrode, an active layer comprising an oxide including indium, zinc and gallium on the gate insulating film, and overlapping the gate electrode, and a source electrode and a drain electrode that are spaced apart from each other, wherein the active layer is formed from a zinc-rich target material, and an atomic % ratio of indium, zinc and gallium in the active layer is different from an atomic % ratio of the zinc-rich target material.
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